Third International Conference on Spoken Language Processing (ICSLP 94)

Yokohama, Japan
September 18-22, 1994

A Study on Pitch Pattern Generation Using HMM-Based Statistical Information

Toshiaki Fukada, Yasuhiro Komori, Takashi Aso, Yasunori Ohora

Media Technology Laboratory, Canon Inc., Kawasaki, Japan

This paper describes a novel pitch pattern generation method for speech synthesis using Hidden Markov Models (HMMs). In the proposed method, the F0 contours of minor phrase are modeled by HMMs (pitch-HMMs). The pitch-HMMs are trained using F0 and AF0considering phonetic environments (e.g. accent type, mora count, mora position, phonemic category, etc). To evaluate the pitch-HMMs, accent identification experiments are performed. The results indicate that the pitch-HMMs can capture the movement in F0 contours appropriately. In the F0 contour generation experiments, the proposed method yields an averaged root mean square error of 132cent (equivalent to 9.2Hz at 120Hz) between the original and the generated F0 contours. Furthermore, an application of the proposed method to text-to-speech system is also discussed.

Full Paper

Bibliographic reference.  Fukada, Toshiaki / Komori, Yasuhiro / Aso, Takashi / Ohora, Yasunori (1994): "A study on pitch pattern generation using HMM-based statistical information", In ICSLP-1994, 723-726.